Paraffin and Deposit Remover RPM-01
Estimulación y Productividad
Description
IDI-RPM 01 is a high-efficiency organic deposit remover formulated for chemical cleaning of production tubing, flowlines, pumps and surface equipment with accumulated paraffins, asphaltenes or mixed deposits. Unlike preventive inhibitors, RPM-01 acts on already-formed deposits, dissolving and dispersing them for removal by system flow. It is used as corrective treatment when flow area reduction or partial plugging has already occurred.
Problem it solves
Depósitos de parafinas y asfaltenos ya formados en tuberías de producción, líneas de flujo y equipos de superficie que reducen el área de flujo efectiva, incrementan la presión diferencial y pueden causar taponamiento de líneas.
Mechanism of Action
Disuelve y dispersa los depósitos orgánicos (parafinas, asfaltenos) mediante la combinación de acción solvente y dispersante, convirtiendo los depósitos sólidos o semisólidos en fluido transportable por el propio flujo del sistema.
Applications
Compatible Fluids
Operational Benefits
- Dissolves and disperses paraffin and asphaltene deposits
- Restores effective flow area without mechanical pigging
- Applicable as batch or slug treatment
- Reduces frequency of mechanical pigging interventions
- Compatible with most production system metallurgies
Usage Conditions
Application as batch or treatment slug. Volume and concentration depend on estimated deposit severity. Pre-evaluation of deposit type is recommended to confirm compatibility.
Technical Standards & References
Product Information
- Code
- IDI-RPM 01
- Family
- Estimulación y Productividad
- Category
- 🔬 Estimulación
- Status
- ● Active
Technical Documentation
Technical Data Sheet
Specifications and usage conditions
Safety Data Sheet
Safety and handling information
The Technical Sheet includes application conditions, dosage and compatibilities. The SDS includes GHS/SGA safety information.
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The published technical information describes the operational applications and benefits of the product. Formulations, chemical compositions and proprietary data are confidential and not published.